Indian Journal of Science and Technology
Year: 2016, Volume: 9, Issue: 44, Pages: 1-6
Mun-Soo Lee and Seung-Cheon Kim*
Department of Smart Convergence Consulting, Hansung University, Seoul, Korea; [email protected], [email protected]
*Author for correspondence
Department of Smart Convergence Consulting, Hansung University, Seoul, Korea; [email protected]
Objectives: The conventional aluminum current collector manufacturing method could not make a surface structure which has effective contact with the active material. Hence, there is a limitation in further lowering the resistance with the aluminum material alone. Methods: Before the process of the conventional electrochemical etching for the high purity aluminum foil current collector, Photolithography, an electronic printing technology used in semiconductors and display is used to provide a solution to the obstacle of designing and controlling surface morphology, thus a current collector with stereoscopic pattern is manufactured. Findings: Because the area of contact between the active material and the current collector was increased effectively and the electron transport path was shortened, improvement of the performance in the EDLC with the patterned current collector could be possible. In order to compare the characteristics of EDLCs using various current collectors, capacitance, ESR and L/C were measured. Improvements/Applications: In all measurement, the patterned EDLC exhibited improved performance compared to conventional EDLC.
Keywords: Aluminum, Convergence, Current Collector, EDLC, Pattern
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